000 03562cam a2200337 a 4500
999 _c90
_d90
001 16994309
003 OSt
005 20191104144135.0
008 111011s2012 flua b 001 0 eng
010 _a 2011035875
020 _a9781439806371 (hardback : acidfree paper)
040 _aDLC
_cDLC
_dDLC
042 _apcc
050 0 0 _aTK8304
_b.S48 2012
082 0 0 _a621.381
_223
_bSi
245 0 0 _aSilicon photonics for telecommunications and biomedicine /
_cedited by Sasan Fathpour, Bahram Jalali.
260 _aBoca Raton, FL :
_bCRC Press,
_cc2012.
300 _axvii, 425 p. :
_bill. ;
_c25 cm.
504 _aIncludes bibliographical references and index.
520 _a"Focusing on the important obstacles to be met in order to make silicon photonics a viable commercial reality, this book provides a concise introduction to major developments in the field. Worldwide experts provide clear explanations of the fundamentals and state-of-the-art approaches. After a historical review, the text discusses the critical areas of silicon wire waveguides and optical parametric effects in silicon, stress and piezoelectric tuning of silicon's optical properties, and short pulse techniques in silicon photonics. It also addresses silicon-based optical resonators, mid-wavelength infrared applications, growth techniques, hybrid lasers on silicon, and energy harvesting. "--
_cProvided by publisher.
520 _a"Today, silicon photonics, the technology for building low-cost and complex optics on a chip, is a thriving community and a blossoming business. The roots of this promising new technology date back to the late 1980s and early 1990s to the work of Soref, Peterman, and others. There were three early findings that paved the path for much of the subsequent progress. First, it was recognized that micrometer-size waveguides, compatible with the CMOS technology of the time, could be realized despite the large refractive index difference between silicon and silicon dioxide (SiO2). Previously, this large refractive index was thought to result in multimode waveguides that are undesirable for building useful interferometric devices such as directional coupler, Mach-Zehnder modulators, and so on. Although, today's submicron (nanophotonic) waveguides are routinely realized and desired for their more efficient use of wafer real estate, the advance fabrication capability needed to fabricate such structures was not widely available to photonic device researchers. Second, it was proposed by Soref that by modulating the free-carrier density, which can be done easily with a diode or a transistor, electro-optic switching can be achieved through the resulting electroabsorption and electrorefraction effects. Third, it was shown that infrared photodectors operating in the telecommunication band centered at 1550 nm can be monolithically integrated onto silicon chips using strained layer GeSi (and eventually Ge) grown directly on silicon. The potential for creating low cost photonics using the silicon CMOS chip manufacturing infrastructure was gradually recognized by the photonics research and business community in the late 1990s and early 2000s"--
_cProvided by publisher.
650 0 _aOptoelectronic devices
_xDesign and construction.
_9346
650 0 _aIntegrated optics.
_9347
650 0 _aTelecommunication
_xMaterials.
_9348
650 0 _aMedical electronics.
_9349
650 0 _aSilicon
_xOptical properties.
_9350
650 0 _aPhotonics.
_9351
700 1 _aFathpour, Sasan.
_9352
700 1 _aJalali, B.
_9353
942 _2ddc
_cBO