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The MOS transistor / (Record no. 930)

000 -LEADER
fixed length control field 08621nam a22002297a 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20200727094858.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 200727b ||||| |||| 00| 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9780199829835
040 ## - CATALOGING SOURCE
Transcribing agency KCST
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.3815284
Item number Ts Tr
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Tsividis, Yannis
9 (RLIN) 341
245 ## - TITLE STATEMENT
Title The MOS transistor /
Statement of responsibility, etc. Yannis Tsividis (Columbia University), Colin McAndrew (Freescale Semiconductor).
250 ## - EDITION STATEMENT
Edition statement Int. 3rd edition
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Place of publication, distribution, etc. New York ; Oxford :
Name of publisher, distributor, etc. Oxford University Press;
Date of publication, distribution, etc. 2012.
300 ## - PHYSICAL DESCRIPTION
Extent xxiv, 711 pages :
Other physical details illustrations ;
Dimensions 24 cm
505 ## - FORMATTED CONTENTS NOTE
Formatted contents note PREFACE ; CHAPTER 1: REVIEW OF FUNDAMENTALS AND MOSFET OVERVIEW ; 1.1 INTRODUCTION ; 1.2 SEMICONDUCTORS ; 1.2.1 INTRINSIC SEMICONDUCTORS, FREE ELECTRONS, AND HOLES ; 1.2.2 EXTRINSIC SEMICONDUCTORS ; 1.2.3 EQUILIBRIUM IN THE ABSENCE OF ELECTRIC FIELD ; 1.2.4 EQUILIBRIUM IN THE PRESENCE OF ELECTRIC FIELD ; 1.2.5 NONEQUILIBRIUM; QUASI-FERMI LEVELS ; 1.2.6 RELATIONS BETWEEN CHARGE DENSITY, ELECTRIC FIELD, AND POTENTIALS; POISSON'S EQUATION ; 1.3 CONDUCTION ; 1.3.1 TRANSIT TIME ; 1.3.2 DRIFT ; 1.3.3 DIFFUSION ; 1.3.4 TOTAL CURRENT ; 1.4 CONTACT POTENTIALS ; 1.5 THE PN JUNCTION ; 1.6 OVERVIEW OF THE MOS TRANSISTOR ; 1.6.1 BASIC STRUCTURE ; 1.6.2 A QUALITATIVE DESCRIPTION OF MOS TRANSISTOR OPERATION ; 1.6.3 A FLUID DYNAMICAL ANALOG ; 1.6.4 MOS TRANSISTOR CHARACTERISTICS ; 1.7 FABRICATION PROCESSES AND DEVICE FEATURES ; 1.8 A BRIEF OVERVIEW OF THIS BOOK ; REFERENCES ; PROBLEMS ; CHAPTER 2: THE MOS CAPACITOR ; 2.1 INTRODUCTION ; 2.2 THE FLATBAND VOLTAGE ; 2.3 POTENTIAL BALANCE AND CHARGE BALANCE ; 2.4 EFFECT OF GATE-BODY VOLTAGE ON SURFACE CONDITION ; 2.4.1 FLATBAND CONDITION ; 2.4.2 ACCUMULATION ; 2.4.3 DEPLETION AND INVERSION ; 2.4.4 GENERAL ANALYSIS ; 2.5 ACCUMULATION AND DEPLETION ; 2.6 INVERSION ; 2.6.1 GENERAL RELATIONS AND REGIONS OF INVERSION ; 2.6.2 STRONG INVERSION ; 2.6.3 WEAK INVERSION ; 2.6.4 MODERATE INVERSION ; 2.7 SMALL-SIGNAL CAPACITANCE ; 2.8 SUMMARY OF PROPERTIES OF THE REGIONS OF INVERSION ; REFERENCES ; PROBLEMS ; CHAPTER 3: THE THREE-TERMINAL MOS STRUCTURE ; 3.1 INTRODUCTION ; 3.2 CONTACTING THE INVERSION LAYER ; 3.3 THE BODY EFFECT ; 3.4 REGIONS OF INVERSION ; 3.4.1 APPROXIMATE LIMITS ; 3.4.2 STRONG INVERSION ; 3.4.3 WEAK INVERSION ; 3.4.4 MODERATE INVERSION ; 3.5 A "V[C[B CONTROL" POINT OF VIEW ; 3.5.1 FUNDAMENTALS ; 3.5.2 THE "PINCHOFF VOLTAGE" ; REFERENCES ; PROBLEMS ; CHAPTER 4: THE FOUR-TERMINAL MOS TRANSISTOR ; 4.1 INTRODUCTION ; 4.2 TRANSISTOR REGIONS OF OPERATION ; 4.3 COMPLETE ALL-REGION MODEL ; 4.4 SIMPLIFIED ALL-REGION MODELS ; 4.4.1 LINEARIZING THE DEPLETION REGION CHARGE ; 4.4.2 BODY-REFERENCED SIMPLIFIED ALL-REGION MODELS ; 4.4.3 SOURCE-REFERENCED SIMPLIFIED ALL-REGION MODELS ; 4.4.4 CHARGE FORMULATION OF SIMPLIFIED ALL-REGION MODELS ; 4.5 MODELS BASED ON QUASI-FERMI POTENTIALS ; 4.6 REGIONS OF INVERSION IN TERMS OF TERMINAL VOLTAGES ; 4.7 STRONG INVERSION ; 4.7.1 COMPLETE STRONG-INVERSION MODEL ; 4.7.2 BODY-REFERENCED SIMPLIFIED STRONG-INVERSION MODEL ; 4.7.3 SOURCE-REFERENCED SIMPLIFIED STRONG-INVERSION MODEL ; 4.7.4 MODEL ORIGIN SUMMARY ; 4.8 WEAK INVERSION ; 4.8.1 SPECIAL CONDITIONS IN WEAK INVERSION ; 4.8.2 BODY-REFERENCED MODEL ; 4.8.3 SOURCE-REFERENCED MODEL ; 4.9 MODERATE-INVERSION AND SINGLE-PIECE MODELS ; 4.10 SOURCE-REFERENCED VS. BODY-REFERENCED MODELING ; 4.11 EFFECTIVE MOBILITY ; 4.12 EFFECT OF EXTRINSIC SOURCE AND DRAIN SERIES RESISTANCES ; 4.13 TEMPERATURE EFFECTS ; 4.14 BREAKDOWN ; 4.15 THE P-CHANNEL MOS TRANSISTOR ; 4.16 ENHANCEMENT-MODE AND DEPLETION-MODE TRANSISTORS ; 4.17 MODEL PARAMETER VALUES, MODEL ACCURACY, AND MODEL COMPARISON ; REFERENCES ; PROBLEMS ; CHAPTER 5: SMALL-CHANNEL AND THIN OXIDE EFFECTS ; 5.1 INTRODUCTION ; 5.2 CARRIER VELOCITY SATURATION ; 5.3 CHANNEL LENGTH MODULATION ; 5.4 CHARGE SHARING ; 5.4.1 INTRODUCTION ; 5.4.2 SHORT-CHANNEL DEVICES ; 5.4.3 NARROW-CHANNEL DEVICES ; 5.4.4 LIMITATIONS OF CHARGE-SHARING MODELS ; 5.5 DRAIN-INDUCED BARRIER LOWERING ; 5.6 PUNCHTHROUGH ; 5.7 COMBINING SEVERAL SMALL-DIMENSION EFFECTS INTO ONE MODEL-A STRONG-INVERSION EXAMPLE ; 5.8 HOT CARRIER EFFECTS; IMPACT IONIZATION ; 5.9 VELOCITY OVERSHOOT AND BALLISTIC OPERATION ; 5.10 POLYSILICON DEPLETION ; 5.11 QUANTUM MECHANICAL EFFECTS ; 5.12 DC GATE CURRENT ; 5.13 JUNCTION LEAKAGE; BAND-TO-BAND TUNNELING; GIDL ; 5.14 LEAKAGE CURRENTS-PARTICULAR CASES ; 5.15 THE QUEST FOR EVER-SMALLER DEVICES ; 5.15.1 INTRODUCTION ; 5.15.2 CLASSICAL SCALING ; 5.15.3 MODERN SCALING ; REFERENCES ; PROBLEMS ; CHAPTER 6: LARGE-SIGNAL MODELING OF THE MOS TRANSISTOR IN TRANSIENT OPERATION ; 6.1 INTRODUCTION ; 6.2 QUASI-STATIC OPERATION ; 6.3 TERMINAL CURRENTS IN QUASI-STATIC OPERATION ; 6.4 EVALUATION OF INTRINSIC CHARGERS IN QUASI-STATIC OPERATION ; 6.4.1 INTRODUCTION ; 6.4.2 STRONG INVERSION ; 6.4.3 MODERATE INVERSION ; 6.4.4 WEAK INVERSION ; 6.4.5 ALL-REGION MODEL ; 6.4.6 DEPLETION AND ACCUMULATION ; 6.4.7 PLOTS OF CHARGES VS. V[G[S ; 6.5 TRANSIT TIME UNDER DC CONDITIONS ; 6.6 LIMITATIONS OF THE QUASI-STATIC MODEL ; 6.7 NON-QUASI-STATIC MODELING ; 6.7.1 INTRODUCTION ; 6.7.2 THE CONTINUITY EQUATION ; 6.7.3 NON-QUASI-STATIC ANALYSIS ; 6.8 EXTRINSIC PARASITICS ; 6.8.1 EXTRINSIC CAPACITANCES ; 6.8.2 EXTRINSIC RESISTANCE ; 6.8.3 TEMPERATURE DEPENDENCE ; 6.8.4 SIMPLIFIED MODELS ; REFERENCES ; PROBLEMS ; CHAPTER 7: SMALL-SIGNAL MODELING FOR LOW AND MEDIUM FREQUENCIES ; 7.1 INTRODUCTION ; 7.2 A LOW-FREQUENCY SMALL-SIGNAL MODEL FOR THE INTRINSIC PART ; 7.2.1 INTRODUCTION ; 7.2.2 SMALL-SIGNAL MODEL FOR THE DRAIN-TO-SOURCE CURRENT ; 7.2.3 SMALL-SIGNAL MODEL FOR THE GATE AND BODY CURRENTS ; 7.2.4 COMPLETE LOW-FREQUENCY SMALL-SIGNAL MODEL FOR THE INTRINSIC PART ; 7.2.5 STRONG INVERSION ; 7.2.6 WEAK INVERSION ; 7.2.7 MODERATE INVERSION ; 7.2.8 ALL-REGION MODELS ; 7.3 A MEDIUM-FREQUENCY SMALL-SIGNAL MODEL FOR THE INTRINSIC PART ; 7.3.1 INTRODUCTION ; 7.3.2 INTRINSIC CAPACITANCES ; 7.4 INCLUDING THE EXTRINSIC PART ; 7.5 NOISE ; 7.5.1 INTRODUCTION ; 7.5.2 WHITE NOISE ; 7.5.3 FLICKER NOISE ; 7.5.4 NOISE IN EXTRINSIC RESISTANCES ; 7.5.5. INCLUDING NOISE IN SMALL-SIGNAL CIRCUITS ; 7.6 ALL-REGION MODELS ; REFERENCES ; PROBLEMS ; CHAPTER 8: SMALL-SIGNAL MODELING FOR HIGH-FREQUENCY OPERATION ; 8.1 INTRODUCTION ; 8.2 A COMPLETE QUASI-STATIC MODEL FOR THE INTRINSIC PART ; 8.2.1 COMPLETE DESCRIPTION OF INTRINSIC CAPACITANCE EFFECTS ; 8.2.2 SMALL-SIGNAL EQUIVALENT CIRCUIT TOPOLOGIES ; 8.2.3 EVALUATION OF CAPACITANCES ; 8.2.4 FREQUENCY REGION OF VALIDITY ; 8.3 Y-PARAMETER MODELS ; 8.4 NON-QUASI-STATIC MODELS ; 8.4.1 INTRODUCTION ; 8.4.2 A NON-QUASI-STATIC STRONG-INVERSION MODEL ; 8.4.3 OTHER APPROXIMATIONS AND HIGHER-ORDER MODELS ; 8.4.4 MODEL COMPARISON ; 8.5 HIGH-FREQUENCY NOISE ; 8.6 CONSIDERATION IN ; REFERENCES ; PROBLEMS ; CHAPTER 9: SUBSTRATE NONUNIFORMITY AND OTHER STRUCTURAL EFFECTS ; 9.1 INTRODUCTION ; 9.2 ION IMPLANTATION AND SUBSTRATE NONUNIFORMITY ; 9.3 SUBSTRATE TRANSVERSE NONUNIFORMITY ; 9.3.1 PRELIMINARIES ; 9.3.2 THRESHOLD VOLTAGE ; 9.3.3 DRAIN CURRENT ; 9.3.4 BURIED-CHANNEL DEVICES ; 9.4 SUBSTRATE LATERAL NONUNIFORMITY ; 9.5 WELL PROXIMITY EFFECT ; 9.6 STRESS EFFECTS ; 9.7 STATISTICAL VARIABILITY ; REFERENCES ; PROBLEMS ; CHAPTER 10: MODELING FOR CIRCUIT SIMULATION ; 10.1 INTRODUCTION ; 10.2 TYPES OF MODELS ; 10.2.1 MODELS FOR DEVICE ANALYSIS AND DESIGN ; 10.2.2 DEVICE MODELS FOR CIRCUIT SIMULATION ; 10.3 ATTRIBUTES OF GOOD COMPACT MODELS ; 10.4 MODEL FORMULATION ; 10.4.1 GENERAL CONSIDERATION AND CHOICES ; 10.5 MODEL IMPLEMENTATION IN CIRCUIT SIMULATORS ; 10.6 MODEL TESTING ; 10.7 PARAMETER EXTRACTION ; 10.8 SIMULATION AND EXTRACTION FOR RF APPLICATIONS ; 10.9 COMMON MOSFET MODELS AVAILABLE IN CIRCUIT SIMULATORS ; 10.9.1 BSIM ; 10.9.2 EKV ; 10.9.3 PSP ; 10.9.4 OTHER MODELS ; REFERENCES ; PROBLEMS ; APPENDICES ; A. BASIC LAWS OF ELECTROSTATIC IN ONE DIMENSION ; B. QUASI-FERMI LEVELS AND CURRENTS ; C. GENERAL ANALYSIS OF THE TWO-TERMINAL MOS STRUCTURE ; D. CAREFUL DEFINITIONS FOR THE LIMITS OF MODERATE INVERSION ; E. GENERAL ANALYSIS OF THE THREE-TERMINAL MOS STRUCTURE ; F. DRAIN CURRENT FORMULATION USING QUASI-FERMI POTENTIALS ; G. MODELING BASED ON PINCHOFF VOLTAGE AND RELATED TOPICS ; H. EVALUATION OF THE INTRINSIC TRANSIENT SOURCE AND DRAIN CURRENTS ; I. QUANTITIES USED IN THE DERIVATION OF THE NON-QUASI-STATIC Y-PARAMETER MODEL ; K. ANALYSIS OF BURIED-CHANNEL DEVICES ; L. MOSFET MODEL BENCHMARK TESTS ; INDEX
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Metal oxide semiconductors
General subdivision Textbooks.
9 (RLIN) 4745
Topical term or geographic name entry element Metal oxide semiconductors
Form subdivision Mathematical models
General subdivision Textbooks.
9 (RLIN) 4746
Topical term or geographic name entry element Metal oxide semiconductor field-effect transistors
General subdivision Textbooks.
9 (RLIN) 4747
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name McAndrew, Colin
9 (RLIN) 4748
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Source of classification or shelving scheme
Koha item type Book
Holdings
Withdrawn status Lost status Source of classification or shelving scheme Damaged status Not for loan Permanent Location Current Location Date acquired Full call number Barcode Date last seen Price effective from Koha item type
          KCST Library KCST Library 2020-07-27 621.38152 Ts Tr 1000000323 2020-07-27 2020-07-27 Book








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